Electrical Failure Analysis (EFA)

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【Hamamatsu】High-Resolution Emission Microscope

【Hamamatsu】High-Resolution Emission Microscope

The PHEMOS®-X is a high-resolution emission microscope that pinpoints failure locations in semiconductor devices by detecting the weak light emissions and heat emissions caused by semiconductor device defects.

Since the PHEMOS®-X is usable in combination with a general-purpose prober, you can do various analysis tasks by using the sample setups you are already familiar with. Installing an optional laser scan system allows acquiring high-resolution pattern images. Different types of detectors are available for various analysis techniques such as emission analysis, thermal analysis, and IR-OBIRCH analysis. The PHEMOS®-X supports a wide variety of tasks and applications ranging from prober socket boards to a large-size 300 mm wafer prober.

 

【Features】

  • Two ultra-high sensitivity camera are mountable (Coverage of different detection wavelength ranges for emission analysis and thermal analysis allows easy selection of an analysis technique that matches the sample and failure mode. )
  • Up to 5 light sources for OBIRCH, DALS and EOP are mountable
  • High accuracy stage designed for advanced devices
Working range of the optical stage
X:± 20mm
* Working range might be narrower than these values due to the prober being used and interference with the sample stage or mounting of a NanoLens.
Y:± 20mm
Z:± 80mm

 

【Lens Selection】

Up to 5 types of objective lenses can be mounted on the motorized turret.
3 types of macro lenses are available. Only one macro lens can be installed on the system.

  • Objective lens
Product Name
Product No.
N.A.
WD(mm)
Analysis
Objective lens 1x for OBIRCH
A7649-01
0.03
20
OBIRCH
Objective lens 2x IR coat
A8009
0.055
34
Emission / OBIRCH
Objective lens NIR 5x
A11315-01
0.14
37.5
Emission / OBIRCH
Objective lens NIR 20x
A11315-03
0.4
20
Emission / OBIRCH
Objective lens PEIR Plan Apo 20x 2000
A11315-21
0.6
10
Emission / OBIRCH
Objective lens PEIR Plan Apo 50x 2000
A11315-22
0.7
10
Emission / OBIRCH
High NA objective lens 50x for IR-OBIRCH
A8018
0.76
12
OBIRCH
Objective lens NIR 100x
A11315-05
0.5
12
Emission / OBIRCH
Objective lens MWIR 0.8x
A10159-02
0.13
22
Thermal emission
Objective lens MWIR 4x
A10159-03
0.52
25
Thermal emission
Objective lens MWIR 8x
A10159-06
0.75
15
Thermal emission
 
  • Macro lens
Product Name
Product No.
N.A.
WD(mm)
Analysis
Macro lens 1.35x for PHEMOS®-X
A7909-16
0.4
25
Emission / OBIRCH
Macro lens 0.24x for InSb camera
A10159-08
0.08
27
Thermal emission
Macro lens 1x for InSb camera
A10159-10
0.33
52
Thermal emission

 

【Specifications】

PHEMOS®-X
Dimensions / Weights
Main Unit
1656 mm (W) × 2000 mm (H) × 1247 mm (D)
Approx. 1640 kg
Operation Desk*1
1000 mm (W) × 700 mm (H) × 800 mm (D)
Approx. 39.2 kg
1480 mm (W) × 700 mm (H) × 800 mm (D)
Approx. 48.6 kg
Line Voltage
Single phase 200 V to 240 V
Power Consumption
Approx. 3300 VA
Vacuum
80 kPa or more
Compressed Air*2
0.6 MPa to 0.7 MPa
*1: Option
*2: Including a regulator

 

 

Founded in 1953, HAMAMATSU Photonics Co., Ltd., is the pioneer of science and technology, coupled with the massive market share of optics science and EFA market. Hamamatsu Group's products are widely used in medical biology, high-energy physics, space exploration, precision analysis and other industries, is the optical industry leader. HAMAMATSU, with largest customer base in semiconductor and display industry, provides leading EFA solutions, OBIRCH emission microscope with high resolution location detection devices, and other professional optical products with technology patents. HAMAMATSU products are equipped with thermal, EMMI, OBIRCH functions.