|
功能
|
特性
|
|---|---|
|
OBIRCH
|
|
|
EMMI相機
|
|
|
電流檢測頭
|
電流檢測頭可用於測量比標準OBIRCH放大器範圍要求更高電壓（最大3 kv）或更高電流（最大6.3 A）的器件。
|
|
Product Name
|
Product No.
|
N.A.
|
WD(mm)
|
Analysis
|
|---|---|---|---|---|
|
Objective lens 1x for OBIRCH
|
A7649-01
|
0.03
|
20
|
OBIRCH
|
|
Objective lens 2x IR coat
|
A8009
|
0.055
|
34
|
Emission / OBIRCH
|
|
Objective lens NIR 5x
|
A11315-01
|
0.14
|
37.5
|
Emission / OBIRCH
|
|
Objective lens NIR 20x
|
A11315-03
|
0.4
|
20
|
Emission / OBIRCH
|
|
Objective lens PEIR Plan Apo 20x 2000
|
A11315-21
|
0.6
|
10
|
Emission / OBIRCH
|
|
Objective lens PEIR Plan Apo 50x 2000
|
A11315-22
|
0.7
|
10
|
Emission / OBIRCH
|
|
High NA objective lens 50x for IR-OBIRCH
|
A8018
|
0.76
|
12
|
OBIRCH
|
|
Objective lens NIR 100x
|
A11315-05
|
0.5
|
12
|
Emission / OBIRCH
|
|
Objective lens MWIR 0.8x
|
A10159-02
|
0.13
|
22
|
Thermal emission
|
|
Objective lens MWIR 4x
|
A10159-03
|
0.52
|
25
|
Thermal emission
|
|
Objective lens MWIR 8x
|
A10159-06
|
0.75
|
15
|
Thermal emission
|
|
Product Name
|
Product No.
|
N.A.
|
WD(mm)
|
Analysis
|
|---|---|---|---|---|
|
Macro lens 1.35x for PHEMOS®-X
|
A7909-16
|
0.4
|
25
|
Emission / OBIRCH
|
|
Macro lens 0.24x for InSb camera
|
A10159-08
|
0.08
|
27
|
Thermal emission
|
|
Macro lens 1x for InSb camera
|
A10159-10
|
0.33
|
52
|
Thermal emission
|
日本濱松光子學株式會社（HAMAMATSU）是全球光子技術、EFA領域的領導品牌。自1953年成立以來，EFA失效分析產品銷往全球半導體各大企業，擁有數量最多的半導體業及面板業客戶。HAMAMATSU為客戶提供EFA失效分析領域的缺陷定位解決方案，開發的微光顯微鏡是業界主流的高解析度熱點定位設備，且擁有多項專利產品。設備具備Thermal，EMMI，OBIRCH等分析功能方法。
